首页> 外文会议>International Conference on Solid State Lighting >Improvement in light-output power of InGaN/GaN light-emitting diodes by p-GaN surface modification using self-assembled metal clusters
【24h】

Improvement in light-output power of InGaN/GaN light-emitting diodes by p-GaN surface modification using self-assembled metal clusters

机译:通过自组装金属簇通过P-GaN表面改性改进InGaN / GaN发光二极管的光输出功率

获取原文
获取外文期刊封面目录资料

摘要

To improve the escape of photons from an LED structure, we fabricated nano-sized cavities on a p-GaN surface utilizing Pt self-assembled metal clusters for an etch mask. Wet and dry etching processes were employed to produce nano-sized cavities on the p-GaN surface. The dry etching process produced cavities with diameters ranging from 200 nm to 450 nm and from 30 to 80 nm in depth, respectively. The wet etching process, however, produced small size cavities with a size of 5 ~ 6 nm. Electroluminescence measurement showed that the relative optical output powers are increased by 88 % as evidenced by frontside measurement compared to those of LEDs with no nano-sized cavities. In addition, the electrical performance was also improved as evidenced by the Ⅰ-Ⅴcharacteristic curves. This enhanced performance can be attributed to an enhancement in light escaping due to the increased light emitting area as the result of the surface cavities and also to the reduced contact resistance due to the increased contact area.
机译:为了改善来自LED结构的光子的逸出,我们在P-GaN表面上制造了纳米尺寸的空腔,利用PT自组装金属簇来蚀刻掩模。使用湿和干蚀刻工艺在P-GaN表面上产生纳米尺寸的空腔。干蚀刻工艺分别产生直径为200nm至450nm和30至80nm深度的空腔。然而,湿法蚀刻工艺产生的小尺寸腔,尺寸为5〜6nm。电致发光测量表明,与没有纳米尺寸腔的LED相比,相对光输出功率增加了88%,如前侧测量所证明的。此外,电气性能也得到改善,如Ⅰ-ⅴ的曲线所证明。这种增强的性能可以归因于由于表面腔作为表面腔的结果增加而导致的光逸出的增强,并且还引起由于增加的接触面积而导致的接触电阻降低。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号