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首页> 外文期刊>IEEE Photonics Technology Letters >Improvement of InGaN-GaN Light-Emitting Diode Performance With a Nano-Roughened p-GaN Surface
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Improvement of InGaN-GaN Light-Emitting Diode Performance With a Nano-Roughened p-GaN Surface

机译:纳米粗糙p-GaN表面改善了InGaN-GaN发光二极管的性能

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This investigation describes the development of InGaN-GaN light-emitting diode (LED) with a nano-roughened top p-GaN surface which uses Ni nano-mask and wet etching. The light output of the InGaN-GaN LED with a nano-roughened top p-GaN surface is 1.4 times that of a conventional LED, and wall-plug efficiency is 45percent higher. The operating voltage of InGaN-GaN LED was reduced from 3.65 to 3.5 V at 20 mA and the series resistance was reduced by 20percent. The light output is increased by the nano-roughening of the top p-GaN surface. The reduction in the series resistance can be attributed to the increase in the contact area of nano-roughened surface.
机译:这项研究描述了具有氮化镓顶部p-GaN表面的InGaN-GaN发光二极管(LED)的开发,该表面使用Ni纳米掩模和湿法蚀刻。具有顶部p-GaN纳米粗糙表面的InGaN-GaN LED的光输出是传统LED的1.4倍,墙插效率提高了45%。 InGaN-GaN LED的工作电压在20 mA下从3.65 V降低到3.5 V,并且串联电阻降低了20%。通过顶部p-GaN表面的纳米粗糙化,增加了光输出。串联电阻的减小可归因于纳米粗糙表面的接触面积的增加。

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