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首页> 外文期刊>Materials Chemistry and Physics >Improvement of InGaN/GaN light emitting diode performance with a nano-roughened p-GaN surface by excimer laser-irradiation
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Improvement of InGaN/GaN light emitting diode performance with a nano-roughened p-GaN surface by excimer laser-irradiation

机译:通过准分子激光辐照提高具有纳米粗糙化p-GaN表面的InGaN / GaN发光二极管的性能

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摘要

In this paper, we reported the InGaN/GaN light emitting diode (LED) with a nano-roughened top p-GaN surface which caused by KrF excimer laser-irradiation. Comparing with the conventional LED, the brightness of InGaN/GaN light emitting diode (LED) was raised by a factor of 1.25 at 20 mA after KrF excimer laser-irradiation (250 mJ cm~(-2) at 248 nm for 25 ns). Meanwhile, the operation voltage of InGaN/GaN LED was reduced from 3.55 to 3.3 V at 20 mA with 29% reduction in the series resistance. The causes for the brightness increase can be attributed to laser-irradiation induced nano-roughening of p-GaN surface. The reduction in the series resistance can be attributed to the increased contact area of nano-roughened surface and higher hole concentration after laser-irradiation.
机译:在本文中,我们报道了由KrF受激准分子激光辐照引起的顶部p-GaN纳米表面粗糙的InGaN / GaN发光二极管(LED)。与传统的LED相比,在KrF受激准分子激光辐照(在248 nm波长下250 mJ cm〜(-2)在25 ns下照射)后,在20 mA下InGaN / GaN发光二极管(LED)的亮度提高了1.25倍。同时,InGaN / GaN LED的工作电压在20 mA下从3.55 V降低到3.3 V,串联电阻降低了29%。亮度增加的原因可归因于激光辐照引起的p-GaN表面纳米粗糙化。串联电阻的减小可归因于纳米粗糙表面的增加的接触面积和激光辐照后较高的空穴浓度。

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