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Peracetic acid as active species in mixtures for selective etching of SiGe/Si layer systems - Aspects of chemistry and analytics

机译:过乙酸作为混合物中的活性物质,用于选择性蚀刻SiGe / Si层系统 - 化学和分析的方面

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Of the many analytical techniques considered, the UV-Vis method using ABTS and the variation of the classical iodometric titration with catalase have proven their reliability and accuracy. Water withdrawal is effective for both kinetics and equilibrium, temperature (reported in [4]) only affects the reaction rate. An ideal combination of water withdrawal and temperature leads to fast and efficient PAA formation. The etchrates correlate well with PAA conc. Over the entire time of formation, with an 18:1 preference for SiGe over sSOI and high etchrates on SiGe.
机译:在考虑的许多分析技术中,使用ABT的UV-VIS方法和具有过氧化酯酸酶的经典碘量滴定的变化已经证明了它们的可靠性和准确性。耗水措施对于动力学和平衡,温度(在[4]中报道)仅影响反应速率。水取出和温度的理想结合导致快速高效的PAA形成。蚀刻物质与PAA浓度良好相关。在整个形成的时间内,用18:1偏好SiGe在SSOI和SiGe上的高蚀刻物。

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