Optical Observation of a Pseudospark Discharge Development in a Source of EUV Radiation

机译：EUV辐射源伪劣开发开发的光学观察

获取原文

页面导航

摘要
著录项
相似文献
相关主题

摘要

The results of pseudospark discharge observation with spatial and temporal resolution together with the measurements of EUV radiation are presented. It is shown that is a mode of superdense glow discharge the electron temperature in the discharge plasma is high enough to provide for generation of EUV radiation without magnetic compression of the plasma channel.

机译：提出了具有空间和时间分辨率与EUV辐射的测量的假谱放电观察的结果。结果表明，如上所述，放电的电子温度放电的模式足够高，以提供在没有等离子体通道的磁性压缩的情况下产生EUV辐射的产生。

著录项

来源
《International Conference on Dense Z-Pinches》|2002年||共4页
会议地点
作者
Yu. D. Korolev; I. M. Datsko; O. B. Frants; V. G. Geyman; R. V. Ivashov; N. V. Landl; N. A. Ratachin; I. A. Shemyakin;
展开▼
作者单位

展开▼
会议组织
原文格式 PDF
正文语种
中图分类 O552.6-532;
关键词

相似文献

外文文献
中文文献
专利

1. Investigation on recovery of gap insulation strength and EUV radiation in the post-discharge stage of a laser-triggered discharge produced tin plasma EUV source [J] . P Lu, S Kitajima, S Lim, Journal of Physics, D. Applied Physics: A Europhysics Journal . 2014,第43期

机译：激光触发放电产生的锡等离子体EUV源放电后的间隙绝缘强度和EUV辐射恢复的研究
2. A novel fast capillary discharge system emitting intense EUV radiation Possible source for EUV lithography [J] . S.R. Mohanty, E. Robert, R. Dussart, Microelectronic Engineering . 2003,第1a2期

机译：一种新型的快速毛细管放电系统，可发出强烈的EUV辐射EUV光刻的可能来源
3. Optical observations of post-discharge phenomena of laser-triggered discharge produced plasma for EUV lithography [J] . Soowon Lim, Seiya Kitajima, Peng Lu, Japanese journal of applied physics . 2015,第1s期

机译：用于EUV光刻的激光触发放电产生等离子体的放电后现象的光学观察
4. Optical Observation of a Pseudospark Discharge Development in a Source of EUV Radiation [C] . Yu. D. Korolev, I. M. Datsko, O. B. Frants, International Conference on Dense Z-Pinches . 2002

机译：EUV辐射源伪劣开发开发的光学观察
5. Experimental investigations of pseudospark discharge and pseudospark produced intense electron beams. [D] . Hu, Jing. 2012

机译：伪火花放电和伪火花产生强电子束的实验研究。
6. Physico-Chemical Surface Modifications of Polyetheretherketone (PEEK) Using Extreme Ultraviolet (EUV) Radiation and EUV-Induced Nitrogen Plasma [O] . Joanna Czwartos, Bogusław Budner, Andrzej Bartnik, 2020

机译：使用极端紫外（EUV）辐射和EUV诱导的氮等离子体的聚醚醚酮（PEEK）的物理化学表面改性
7. Development of EUV Light Source for Optical Lithography by CO₂ Laser-Produced Plasma [O] . 2005

机译：CO _{2 激光产生等离子体光学光刻的EUV光源的研制}
8. Optical Radiation Emissions from Selected Sources. Part 2. High Intensity Discharge Lamps [R] . Knight, W. B. 1984

机译：选定来源的光辐射。第2部分。高强度放电灯

Optical Observation of a Pseudospark Discharge Development in a Source of EUV Radiation

摘要

著录项

相似文献

相关主题

期刊订阅