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Development of EUV Light Source for Optical Lithography by CO₂ Laser-Produced Plasma

机译：CO _{2 激光产生等离子体光学光刻的EUV光源的研制}

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1. Development of Laser-Produced Tin Plasma-Based EUV Light Source Technology for HVM EUV Lithography [J] . JunichiFujimoto, TsukasaHori, TatsuyaYanagida, Physics Research International . 2012,第4期

机译：用于HVM EUV光刻的激光生产的基于锡等离子体的EUV光源技术的开发
2. Laser-Produced Plasma Light Sources for EUV Lithography [J] . DAVID C. BRANDT, IGOR V. FOMENKOV, BRUNO M. LA FONTAINE, Solid state technology . 2012,第5期

机译：激光产生的等离子光刻用等离子光源
3. Performance results of laser-produced plasma test and prototype light sources for EUV lithography [J] . Norbert R. Böwering Igor V. Fomenkov David C. Brandt Alexander N. Bykanov Alex I. Ershov William N. Partlo David W. Myers Nigel R. Farrar Georgiy O. Vaschenko Oleh V. Khodykin Jerzy R. Hoffman Christopher P. Chrobak Shailendra N. Srivastava Imtiaz Ahmad Chirag Rajyaguru et al. Journal of Micro/Nanolithography,MEMS and MOEMS . 2009,第4期

机译：激光产生的等离子测试和原型光源用于EUV光刻的性能结果
4. Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography [C] . Junichi Fujimoto, Hakaru Mizoguchi Conference on extreme ultraviolet (EUV) lithography III . 2012

机译：用于HVM EUV光刻的激光生产的基于等离子体的EUV光源技术的开发
5. Emission characteristics of Nd:YAG and CO2 laser-produced tin plasmas for extreme ultraviolet lithography source development. [D] . Campos, David Daniel. 2010

机译：Nd：YAG和CO2激光产生的锡等离子体的发射特性，可用于极端紫外光刻源的开发。
6. Time-resolved two-dimensional profiles of electron density and temperature of laser-produced tin plasmas for extreme-ultraviolet lithography light sources [O] . Kentaro Tomita, Yuta Sato, Syouichi Tsukiyama, -1

机译：极紫外光刻光源的激光产生的锡等离子体的电子密度和温度的时间分辨二维分布
7. Development of EUV Lithography Source Based on Laser-Produced Plasma [O] . 2007

机译：基于激光生产等离子体的EUV光刻源的开发
8. Advanced source studies on laser produced plasmas for EUV lithography [R] . Spitzer, R. C. , Gaines, D. P. 1995

机译：用于EUV光刻的激光产生等离子体的高级源研究

Development of EUV Light Source for Optical Lithography by CO2 Laser-Produced Plasma

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Development of EUV Light Source for Optical Lithography by CO₂ Laser-Produced Plasma