首页> 外国专利> Device for suppressing partial emission of a radiation source based on a hot plasma, especially an EUV radiation source, has a debris filter with plates radially aligned with the optical axis of a radiation source

Device for suppressing partial emission of a radiation source based on a hot plasma, especially an EUV radiation source, has a debris filter with plates radially aligned with the optical axis of a radiation source

机译:用于抑制基于热等离子体的辐射源(尤其是EUV辐射源)的部分发射的装置具有碎片过滤器,该碎片过滤器的板与辐射源的光轴径向对齐

摘要

Device for suppressing partial emission of a radiation source based on a hot plasma, especially an EUV radiation source, has a debris filter (1) with plates (11) radially aligned with the optical axis (2) of a radiation source. The plates have a pair of parallel edges and are arranged orthogonal between an inner and an outer sleeve surface. The sleeve surfaces are tensioned by the parallel edges of the plates and are arranged in a rotational symmetrical manner to the optical axis so that a plasma for a spatial angle by a plates bundle.
机译:用于抑制基于热等离子体,特别是EUV辐射源的辐射源的部分发射的装置具有碎片过滤器(1),该碎片过滤器(1)具有与辐射源的光轴(2)径向对准的板(11)。这些板具有一对平行的边缘,并且正交地布置在内套筒表面和外套筒表面之间。套筒表面通过板的平行边缘张紧,并且相对于光轴旋转对称地布置,使得等离子体通过板束在空间角度上成束。

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