Collector used in projection exposure system, for aligning extreme UV (EUV) radiation of EUV laser plasma source, has sub unit whose passage opening feeds material from plasma source feed device and adapts to scattering of trajectories

摘要

The collector has a collector sub unit having a reflecting surface for reflection of a radiation source (14) of an emitted radiation. The reflecting surface is formed such that an optical axis (28) for the propagation of radiation is aligned. The collector sub unit is provided with a passage opening for feeding material from a plasma source feed device. The passage opening is provided for adapting to a scattering of trajectories of the material along a direction around 10% of large entire aspect ratio. Independent claims are included for the following: (1) illumination device; (2) method for creating directed EUV radiation; (3) lighting system; and (4) projection exposure system.