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Laser plasma EUV light source, target material, tape material, a method of producing target material, a method of providing targets, and an EUV exposure device

机译:激光等离子体EUV光源,靶材,带材,靶材的制造方法,靶材的制造方法以及EUV曝光装置

摘要

Target 1 that is arranged in the disc direction is sprayed from nozzle 2 that has a slit-shaped aperture. Target 1 is conveyed on a gas stream. He gas is used in this example. Nozzle 2 may be vibrated by a piezo apparatus to spray disc-shaped target 1. Target 1 that is sprayed from nozzle 2 reaches the irradiation position of laser light with its direction unchanged since the exterior of nozzle 2 is maintained in a high vacuum. Synchronized with delivery of target 1, pulse laser light 5 from Nd:YAG light source 4 is focused by lens 3 and irradiated onto target 1. The spot diameter of the laser is the same 1 mm diameter as that of target 1. The thickness is not more than 1000 nm. Therefore, virtually the entire target is converted into plasma, debris generation is inhibited and the conversion efficiency is elevated.
机译:从具有狭缝状的孔的喷嘴 2 喷射沿圆盘方向配置的靶 1 。目标 1 在气流中传输。在此示例中使用了氦气。喷嘴 2 可以通过压电装置振动以喷射圆盘形靶 1 。从喷嘴 2 喷出的目标 1 到达喷嘴的方向不变的激光照射位置,因为喷嘴 2 的外部保持在高真空。与目标 1 的传送同步,来自Nd:YAG光源 4 的脉冲激光 5 被镜头 3 并照射到目标 1 上。激光的光斑直径与目标 1 的直径相同,为1 mm。厚度不超过1000nm。因此,实际上,整个靶都转化为等离子体,抑制了碎屑的产生并且提高了转化效率。

著录项

  • 公开/公告号US7456417B2

    专利类型

  • 公开/公告日2008-11-25

    原文格式PDF

  • 申请/专利权人 KATSUHIKO MURAKAMI;HIDEYA INOUE;

    申请/专利号US20060329116

  • 发明设计人 HIDEYA INOUE;KATSUHIKO MURAKAMI;

    申请日2006-01-11

  • 分类号G21G4/00;G01N21/64;G01J3/10;

  • 国家 US

  • 入库时间 2022-08-21 19:29:11

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