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P-type doping of cubic GaN by carbon

机译:碳的立方GaN的p型掺杂

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Successful p-type doping of cubic GaN epilayers by carbon using an e-beam evaporation source is reported. At room temperature Hall-effect measurements of the C-doped cubic GaN epilayer gave hole concentrations and hole mobilities as high as 6×10{sup}17 cm{sup}(-3) and 200 cm{sup}2/Vs, respectively. The thermal activation energy of the C-acceptor is (215 ± 10) meV. Low temperature photoluminescence spectra show a new line appearing at 3.08 eV The emission energy increases with increasing e-beam evaporation power. This 3.08 eV line is attributed to a C related donor acceptor (D{sup}0A{sup}0) transition.
机译:报道了使用电子束蒸发源通过碳成功的P型掺杂立方GaN外延。在室温下,C掺杂立方GaN epilayer的展示效果测量为高达6×10 {sup} 17cm {sup}( - 3)和200cm {sup} 2 / vs的孔浓度和孔迁移率。 C型受体的热激活能量是(215±10)MEV。低温光致发光光谱显示出在3.08eV时出现的新线,发射能量随着电子束蒸发功率的增加而增加。此3.08 EV线归因于C相关捐赠者受体(D {sup} 0a {sup} 0)转换。

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