首页> 外国专利> METHOD FOR MANUFACTURING P-TYPE GaN-BASED COMPOUND SEMICONDUCTOR, METHOD FOR ACTVATING P-TYPE DOPANT CONTAINED IN GaN-BASED COMPOUND SEMICONDUCTOR, GaN-BASED COMPOUND SEMICONDUCTOR DEVICE, AND GaN-BASED COMPOUND SEMICONDUCTOR LIGHT-EMITTING DEVICE

METHOD FOR MANUFACTURING P-TYPE GaN-BASED COMPOUND SEMICONDUCTOR, METHOD FOR ACTVATING P-TYPE DOPANT CONTAINED IN GaN-BASED COMPOUND SEMICONDUCTOR, GaN-BASED COMPOUND SEMICONDUCTOR DEVICE, AND GaN-BASED COMPOUND SEMICONDUCTOR LIGHT-EMITTING DEVICE

机译:制造p型GaN基复合半导体的方法,激活包含在GaN基复合半导体中的p型掺杂剂的方法,GaN基复合半导体器件以及GaN基复合半导体光发射器

摘要

The present invention increases the hole concentration and improves the electrical properties of a p-type gallium nitride compound semiconductor layer by activating the p-type dopant contained in the gallium nitride compound semiconductor using an electrochemical potentiostatic method. It is intended to provide a method which can be done and to provide a gallium nitride compound semiconductor device and a light emitting device manufactured using the method.
机译:本发明通过使用电化学恒电位方法活化包含在氮化镓化合物半导体中的p型掺杂剂来增加空穴浓度并改善p型氮化镓化合物半导体层的电性能。旨在提供一种可以完成的方法,并提供一种氮化镓化合物半导体器件和使用该方法制造的发光器件。

著录项

  • 公开/公告号KR101171817B1

    专利类型

  • 公开/公告日2012-08-14

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20100016425

  • 发明设计人 유병소;이준기;권광우;

    申请日2010-02-23

  • 分类号H01L33/32;

  • 国家 KR

  • 入库时间 2022-08-21 17:07:41

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