首页> 外文会议>Gallium Arsenide Integrated Circuit (GaAs IC) Symposium, 1990. Technical Digest 1990., 12th Annual >Reliability analysis of GaAs/AlGaAs HBTs under forwardcurrent/temperature stress
【24h】

Reliability analysis of GaAs/AlGaAs HBTs under forwardcurrent/temperature stress

机译:前向GaAs / AlGaAs HBT的可靠性分析电流/温度应力

获取原文

摘要

The reliability of GaAs/AlGaAs heterojunction bipolar transistorsis investigated by accelerated life-testing of discrete devices underforward bias stress at elevated temperatures. The DC devicecharacteristics are monitored to evaluate the effect of bias/temperaturestress on a large number of devices fabricated on MBE (molecular beamepitaxy) grown material. The primary degradation observed in somedevices is a reduction in the current gain which appears to be due to anelectric field-aided diffusion of interstitial Be from the base into thebase-emitter graded region. Other devices with optimal epitaxialmaterial show stable current gain after DC bias stress at hightemperature. Ohmic contact degradation, with or without bias, is alsoobserved at the emitter contact, resulting in an increased emitterseries resistance
机译:GaAs / AlGaAs异质结双极晶体管的可靠性 通过加速分立器件在以下条件下的寿命测试来进行研究 高温下的正向偏置应力。直流设备 监视特性以评估偏置/温度的影响 在MBE(分子束)上制造的大量设备上受到应力 外延)生长的材料。在某些情况下观察到的主要降解 设备是电流增益的减少,这似乎是由于 电场辅助间隙Be的扩散 基极-发射极分级区域。其他具有最佳外延的器件 高直流偏压后,材料显示稳定的电流增益 温度。在有或没有偏压的情况下,欧姆接触的退化也是 在发射极触点处观察到,导致发射极增加 串联电阻

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号