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Mechanism of Buffer-Related Current Collapse in AlGaN/GaN HEMT

机译:AlGaN / GaN HEMT中与缓冲有关的电流崩塌机理

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Current collapse, as one of the most important factors that affect the characteristics of AlGaN/GaN HEMTs has studied for long, but there is still no uniform conclusion on its mechanism. Transient pulse method and DC method are employed to analyze the dependence of current collapse on buffer layer trap based on numerical simulation. The transient pulse simulation shows that, during the negative part of RF cycle, a large number of channel electrons(2DEG) at the gate edge of the drain side are trapped by buffer layer traps, which is dependent on the high electric field intensity. When the RF waveform on its positive half cycle, the electric field intensity under the gate edge of the drain side is reduced and the buffer layer trap begin to emit the trapped electrons. However, due to the slower emission rate, the density of the 2DEG cannot be fully recovered before the next half of RF cycle. That's the reason why the output current is scaled smaller in transient condition than it is in DC condition. The DC simulation suggests that hot electrons influence the charge transport by spilling over into the bulk GaN where they are captured by traps. It leads to negative differential conductivity in the output characteristics.
机译:作为影响AlGaN / GaN HEMTs特性的最重要因素之一,电流崩塌已进行了很长时间的研究,但其机理尚无统一的结论。基于数值模拟,采用瞬态脉冲法和直流法分析了电流崩塌对缓冲层阱的依赖性。瞬态脉冲仿真表明,在RF周期的负值期间,漏极侧栅极边缘的大量沟道电子(2DEG)被缓冲层陷阱捕获,这取决于高电场强度。当RF波形处于其正半周期时,漏极侧栅极边缘下方的电场强度降低,并且缓冲层陷阱开始发射被捕获的电子。但是,由于发射速率较慢,因此2DEG的密度无法在下一个RF周期之前完全恢复。这就是为什么在瞬态条件下输出电流的比例要小于直流条件下的比例的原因。直流模拟表明,热电子会溢出到整个GaN中,从而被陷阱俘获,从而影响电荷传输。这导致输出特性的负差分电导率。

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