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The Study of SOI Split-drain Field-effect Hall Sensor in Partial Depletion Mode

机译:SOI分流场效应霍尔传感器在部分耗尽模式下的研究

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摘要

The experimental results of Silicon on insulator split-drain field-effect Hall sensor (SOI SD FEHS) are presented. It is magnetic sensors based on metal-oxide-semiconductor- oxide-metal field-effect transistor structures with high magnetosensitivity in partial depletion mode. Such sensors have a number of advantages due to the expansion of the device functionality. A method of measuring the experiment was developed. Measurements were made at room temperature. As a result, the following curves were obtained: the voltage difference on the load resistances of the measuring circuit (ΔV) versus the gate voltage gate at room temperature, the dV versus the magnetic field, the amplitude of the peak versus the nominal load resistance, etc. Recalculating the voltage difference across the load resistances - ΔV to magnetosensitivity, the specific magnetosensitivity of SOI FEHS SD can reach values of 105 V / A × T, which is significantly higher than any known Hall semiconductor elements..
机译:介绍了绝缘体分裂场效应霍尔传感器(SOI SD FEH)硅的实验结果。它是基于金属氧化物半导体氧化物 - 金属场效应晶体管结构的磁传感器,其具有部分耗尽模式具有高磁化敏感性。由于设备功能的扩展,这种传感器具有许多优点。开发了一种测量实验的方法。测量在室温下进行。结果,获得了以下曲线:测量电路的负载电阻(ΔV)的电压差与栅极电压栅极在室温下,DV与磁场,峰值的幅度与标称负载电阻相比等等等重新计算负载电阻上的电压差 - ΔV到磁化敏感性,SOI FEHS SD的特定磁化性可以达到10的值 5 v / a×t,其显着高于任何已知的霍尔半导体元件。

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