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Fine pitch Cu wire bonding — As good as gold

机译:细间距铜丝键合—和金一样好

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Fine pitch gold wire bonding is the pre-eminent technology for die interconnection and has been advanced to very fine wire diameters. Copper wire bonding has been used for many years as well but was relegated to large wire diameters in automotive and power applications. The surge in gold commodity prices to more than 1,000 USD has fueled great interest in converting fine wire packaging from gold to copper. For course wire bonding, the challenges of harder and stiffer wire metallurgy, the propensity of oxidation and corrosion have been managed successfully. Fundamental studies had determined that intermetallic growth was an order of magnitude less than for gold and that the analysis for intermetallic coverage was considerably more difficult than in the case of gold. Additional challenges have arisen by the advancement of wafer nodes which have employed ever more brittle dielectrics and complex metal stack structures. Here, the development of high volume, fine pitch copper wire bonding will be described. Many of the coarse wire approaches can be adapted to fine pitch copper bonding with success. A rigorous evaluation and qualification methodology has been adopted to ensure highly efficient processes with yields equivalent to gold bonding and superior bonder machine efficiencies. At present devices of the 65 nm nodes are in production and 40/45 nm nodes are in qualification. Extended JEDEC type reliability testing has been performed to demonstrate the long term reliability of copper wire bonding.
机译:细间距金线键合是管芯互连的杰出技术,并且已经发展到非常细的线径。铜线键合也已经使用了很多年,但在汽车和电源应用中却被局限于大直径的导线。黄金商品价格飙升至1,000美元以上,引起了人们对将细线包装从黄金转换为铜的极大兴趣。对于导线键合,已经成功应对了越来越硬的导线冶金学,氧化和腐蚀倾向的挑战。基础研究确定,金属间化合物的生长量要比黄金少一个数量级,并且金属间化合物覆盖率的分析要比黄金要困难得多。晶片节点的发展带来了另外的挑战,晶片节点已经采用了越来越脆的电介质和复杂的金属堆叠结构。在此,将描述大体积,细间距铜线键合的发展。许多粗线方法都可以成功地用于精细间距的铜键合。采用了严格的评估和鉴定方法,以确保高效的过程,其产量等同于金键合和卓越的键合机效率。目前,65 nm节点的器件已投入生产,40/45 nm节点已通过鉴定。已经进行了扩展的JEDEC型可靠性测试,以证明铜线键合的长期可靠性。

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