首页> 外文会议>High Density Microsystem Design and Packaging and Component Failure Analysis, 2004. HDP '04. Proceeding of the Sixth IEEE CPMT Conference on >Effects of contact metallizations on electrical resistance reliability of ACF interconnection for chip on flex application
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Effects of contact metallizations on electrical resistance reliability of ACF interconnection for chip on flex application

机译:接触金属化对柔性应用芯片上ACF互连的电阻可靠性的影响

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Although there have been many years of development, the reliability of the electrical performance of anisotropically conductive adhesives or films (ACAs or ACFs) interconnection for flip chip assembly is still a critical drawback despite wide application. In-depth study about the reliability and degradation mechanism of ACF interconnection is necessary. In this paper, effects of contact metallizations on electrical resistance reliability of ACF interconnection for flip chip on flex substrate was investigated using different bump/pad metallizations couple. Contact resistance changes were monitored during reliability tests such as high humidity and temperature, and thermal cycling. Both the higher initial contact resistance and rapid increment were investigated in ACF assemblies with Ni-Cu coupled metallization. The potential causes for the bigger degradation of Ni-Cu coupled ACF were analysed.
机译:尽管已经进行了多年的开发,但是尽管应用广泛,但用于倒装芯片组装的各向异性导电粘合剂或薄膜(ACA或ACF)互连的电性能的可靠性仍然是一个关键的缺点。有必要对ACF互连的可靠性和降级机理进行深入研究。在本文中,使用不同的凸块/焊盘金属化对,研究了接触金属化对柔性衬底上的倒装芯片ACF互连的电阻可靠性的影响。在可靠性测试(例如高湿度和高温以及热循环)期间,会监控接触电阻的变化。在具有Ni-Cu耦合金属化的ACF组件中,研究了较高的初始接触电阻和快速增加的情况。分析了Ni-Cu偶联ACF更大降解的潜在原因。

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