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Effects of contact metallizations on electrical resistance reliability of ACF interconnection for chip on flex application

机译:接触金属化对芯片芯片互联电阻可靠性的影响

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Although there have been many years of development, the reliability of the electrical performance of anisotropically conductive adhesives or films (ACAs or ACFs) interconnection for flip chip assembly is still a critical drawback despite wide application. In-depth study about the reliability and degradation mechanism of ACF interconnection is necessary. In this paper, effects of contact metallizations on electrical resistance reliability of ACF interconnection for flip chip on flex substrate was investigated using different bump/pad metallizations couple. Contact resistance changes were monitored during reliability tests such as high humidity and temperature, and thermal cycling. Both the higher initial contact resistance and rapid increment were investigated in ACF assemblies with Ni-Cu coupled metallization. The potential causes for the bigger degradation of Ni-Cu coupled ACF were analysed.
机译:虽然已经有多年的发展,但是,尽管应用范围广,但是倒装芯片组件的各向异性导电粘合剂或薄膜(ACAS或ACFS)互连的可靠性仍然是关键缺点。关于ACF互连的可靠性和降解机理的深入研究是必要的。本文采用不同的凸块/垫金属化对耦合研究了与柔性基板上倒装芯片互联互连电阻可靠性的影响。在高湿度和温度等可靠性测试期间监测接触电阻变化,以及热循环。在具有Ni-Cu偶联金属化的ACF组件中研究了较高的初始接触电阻和快速增量。分析了Ni-Cu偶联ACF更大降解的潜在原因。

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