This paper discuss the resist profile, Resolution and the pattern fidelity of sub-micron feature in each PBS,ZEP-7000, CAR (chemical amplify resist) process that is reviewed the SEM (Scanning Electron Microscope) analysis. And it is to compare the lithographic performance of Raster scan e-beam writer (10 Kv) and Vector scan E-beam writer (50 Kv), variable shape Beam with different Electron beam resist as PBS, the most Popular Resist in many users, ZEP-7000 and CAR (Chemical amplify resist) which shows different process characteristic in Dose sensitivity, process latitude, stability.
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