首页> 外文会议>Indium Phosphide and Related Materials, 1998 International Conference on >High breakdown voltage and high f/sub max/ InAlAs/InGaAs HEMTs on GaAs
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High breakdown voltage and high f/sub max/ InAlAs/InGaAs HEMTs on GaAs

机译:GaAs上的高击穿电压和f / sub max / InAlAs / InGaAs HEMT

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A simple model to describe the dependence of both the breakdown voltage between a gate and a drain (BV/sub gd/) and maximum frequency of oscillation (f/sub max/) on a width of the gate recess in an InAlAs/InGaAs high electron mobility transistor (HEMT) is presented. The model suggests that the wide recess structure can improve both BV/sub gd/ and f/sub max/, which is experimentally confirmed. We fabricated InAlAs/InGaAs HEMTs lattice-mismatched on GaAs substrates with optimum recess-width, and these exhibited both a high BV/sub gd/ of 14 V and a high f/sub max/ of 127 GHz at a gate length of 0.66 /spl mu/m.
机译:一个简单的模型来描述栅极和漏极之间的击穿电压(BV / sub gd /)和最大振荡频率(f / sub max /)与InAlAs / InGaAs高栅凹槽宽度之间的关系介绍了电子迁移率晶体管(HEMT)。该模型表明,宽凹槽结构可以同时改善BV / sub gd /和f / sub max /,这在实验上得到了证实。我们在具有最佳凹槽宽度的GaAs衬底上制造了晶格不匹配的InAlAs / InGaAs HEMT,并且在栅极长度为0.66 /时,既显示出14 V的高BV / sub gd /,又出现了127 GHz的f / sub max /。 spl立方米/米

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