首页> 外文会议>Indium Phosphide and Related Materials, 1998 International Conference on >Effect of InP passivation on carrier recombination in In/sub x/Ga/sub 1-x/As/GaAs surface quantum wells
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Effect of InP passivation on carrier recombination in In/sub x/Ga/sub 1-x/As/GaAs surface quantum wells

机译:InP钝化对In / sub x / Ga / sub 1-x / As / GaAs表面量子阱中载流子复合的影响

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Carrier recombination in surface and near-surface In/sub x/Ga/sub 1-x/As/GaAs quantum wells was studied using time-resolved and cw photoluminescence spectroscopy. Surface passivation by an ultrathin layer (1 ML) of InP was found to yield dramatically enhanced luminescence intensity. A blue shift due to the vacuum barrier on the surface was measured to be as high as 70 meV for a passivated 3 nm thick In/sub 0.25/Ga/sub 0.75/As/GaAs surface QW. The carrier recombination dynamics was studied for 7 nm thick In/sub 0.10/Ga/sub 0.90/As/GaAs surface and near-surface QWs. A carrier lifetime of 40 ps was obtained for an unpassivated near-surface QW whereas lifetimes of 300 ps and 245 ps were measured for passivated near-surface and surface QWs, respectively. The results indicate that the passivation reduces the surface recombination remarkably.
机译:使用时间分辨和连续光致发光光谱研究了表面和近表面In / sub x / Ga / sub 1-x / As / GaAs量子阱中的载流子复合。发现通过InP的超薄层(1 ML)进行的表面钝化可产生显着增强的发光强度。对于钝化的3nm厚的In / sub 0.25 / Ga / sub 0.75 / As / GaAs表面QW,由于表面上的真空阻挡层而导致的蓝移被测量为高达70meV。研究了7 nm厚In / sub 0.10 / Ga / sub 0.90 / As / GaAs表面和近表面QW的载流子复合动力学。未钝化的近表面QW的载流子寿命为40 ps,而钝化的近表面和表面QW的载流子寿命分别为300 ps和245 ps。结果表明钝化显着降低了表面重组。

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