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Thermoelectric Cooling Device Based on Holey Silicon

机译:基于多孔硅的热电冷却装置

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摘要

While thermal management of advanced electronics is becoming more challenging, recent advances in thermoelectric materials are renewing interest in developing solid-state cooling devices based on the Peltier effects. In particular, a silicon nanostructure with vertically-etched holes, known as holey silicon, has attracted much attention by showing thermal conductivity anisotropy beyond the prediction of classical models without losing the excellent electrical properties or other practical attributes of silicon. Despite the potential of holey silicon as a thermoelectric material as demonstrated in the studies of fundamental properties, its impact on thermoelectric cooling or the connection of fundamental properties to device-level performance has not been studied in detail. Here, we evaluate the use of holey silicon as a thermoelectric cooling structure by combining spectral scaling models that predict the size dependent thermal transport properties with a 3D finite-element thermoelectric cooling model. Our numerical simulations demonstrate the thermoelectric cooling performance of holey silicon with a wide range of high hot spot heat flux (700 ~ 500 W/cm2). The thermoelectric cooling limits of the surface-cooler design are investigated in detail and a new embedded-cooler design with 50% more hot spot temperature reduction is proposed and discussed in detail.
机译:尽管先进电子设备的热管理变得越来越具有挑战性,但热电材料的最新进展重新激发了人们对基于珀尔帖效应开发固态冷却设备的兴趣。特别地,具有垂直蚀刻的孔的硅纳米结构,称为多孔硅,通过显示超出经典模型的预测的导热系数各向异性而引起人们的广泛关注,而不会丧失硅的优异电性能或其他实用属性。尽管在基本性能研究中证明了多孔硅作为热电材料的潜力,但尚未详细研究其对热电冷却的影响或基本性能与器件级性能的关系。在这里,我们通过结合预测尺寸依赖的热传输特性的光谱缩放模型与3D有限元热电冷却模型,来评估多孔硅作为热电冷却结构的用途。我们的数值模拟表明,多孔硅的热电冷却性能具有很高的热点热通量范围(700〜500 W / cm) 2 )。详细研究了表面冷却器设计的热电冷却极限,并提出并详细讨论了热点温度降低50%以上的新型嵌入式冷却器设计。

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