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A Comprehensive Study on Stress and Warpage by Design, Simulation and Fabrication of RDL-First Panel Level Fan-Out Technology for Advanced Package

机译:通过高级封装的RDL-First Panel级扇出技术的设计,仿真和制造对应力和翘曲的综合研究

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Rapid development of semiconductor technology and multi-function demands of end products has driven IC foundry industry toward 7nm node process, and even next generation of 5nm. The I/O pitch of chip is reduced accordingly but the build-up layer of IC carrier is still too large to fit interconnects. In order to overcome the gap of I/O pitch between IC chip and carrier, the interposer technology has been considered as a solution to resolve the issue. However, the cost of silicon interposer is too high, and the glass interposer lacks the associated infrastructure and is difficult to be handled, which makes a technology drawback for market applications. Alternatively, fan-out wafer/panel level package technology is getting more attractions for advanced package recently because of its features of low profile, small form factor, and high bandwidth with fine line re-distribution layer (RDL) routability. There are lots of literatures addressing about the residual stress and warpage mostly on wafer level fan-out technology, especially for chip-first technology scheme. However, comprehensive study on the panel level fan-out is not mature yet. This paper investigates fundamental factors that impact the residual stress and warpage level of panel level fan-out package, such as metal layer counts, thickness of dielectric and metal layer, coefficient of thermal expansion (CTE) and Young's modulus of dielectric and molding compound, molding gap and molding process temperature, etc. In this study, a RDL-first (chip-last) fan-out panel level structure of three metal layers on releasing film molded with epoxy compound was established as a simulation model by means of finite element analysis software. The simulation results provide a guideline of design rules for fabricating multi-layer RDL panel level fan-out package and making the minimum residual stress while chip assembly. Fabrication of three-layer dielectric panel level fan-out, where 370mmx470mm panel size is applied, is also demonstrated to compare with the simulation results.
机译:半导体技术的飞速发展和终端产品的多功能需求推动了IC代工行业朝着7nm节点工艺乃至下一代5nm方向发展。芯片的I / O间距相应降低,但是IC载体的堆积层仍然太大,无法容纳互连。为了克服IC芯片和载体之间的I / O间距的差距,中介层技术已被视为解决该问题的解决方案。然而,硅中介层的成本太高,并且玻璃中介层缺乏相关的基础设施并且难以处理,这对市场应用造成了技术缺陷。另外,扇形晶圆/面板级封装技术因其外形小巧,外形小巧,具有高带宽以及细线重分布层(RDL)布线能力而变得越来越受高端封装的青睐。关于残余应力和翘曲的文献很多,主要涉及晶圆级扇出技术,尤其是芯片优先技术方案。但是,关于面板级扇出的综合研究尚不成熟。本文研究了影响面板级扇出型封装的残余应力和翘曲水平的基本因素,例如金属层数,电介质和金属层的厚度,热膨胀系数(CTE)以及电介质和模塑料的杨氏模量,通过有限元模拟,建立了三层金属层在环氧胶模压离型膜上的RDL-first(芯片-最后)扇出面板级结构作为仿真模型。分析软件。仿真结果为设计多层RDL面板级扇出封装并在芯片组装时使残余应力最小化提供了设计准则的指导。还演示了采用370mmx470mm面板尺寸的三层电介质面板级扇出的制造,以与仿真结果进行比较。

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