300mm implant: pilot production at SEMICONDUCTOR300

摘要

This paper presents the history, key results, and current status of two 300 mm ion implant systems used in the pilot production of 64M DRAM at SEMICONDUCTOR300 in Dresden, Germany. Data from the Axcelis (formerly Eaton SEO) HE-3 and the Varian VIISta 80 is presented. Additional topics include 300 mm automation, maximum beam current production, throughput, and process performance.