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Vertical interconnections using through encapsulant via (TEV) and through silicon via (TSV) for high-frequency system-in-package integration

机译:垂直互连使用直通密封剂通孔(TEV)和直通硅通孔(TSV)进行高频系统级封装

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In this paper we investigate two vertical interconnect options for high-frequency system-in-package (SiP) integration: through encapsulant via (TEV) applied to the embedded wafer level ball grid array (eWLB) technology and through silicon via (TSV). We compare both solutions in terms of size and electrical performance. We use analytic expressions and electromagnetic simulations for our analysis and present measurement results of selected structures for verification. The results show that the choice of TEV and TSV depends on application and cost window.
机译:在本文中,我们研究了两个用于高频系统级封装(SiP)集成的垂直互连选项:通过应用于嵌入式晶圆级球栅阵列(eWLB)技术的密封通孔(TEV)和通过硅通孔(TSV)的硅通孔。我们比较两种解决方案的尺寸和电气性能。我们使用分析表达式和电磁模拟进行分析,并提供选定结构的测量结果进行验证。结果表明,TEV和TSV的选择取决于应用程序和成本窗口。

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