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A straightforward method to prepare chalcopyrite CIGS films by one-step sputtering process without extra Se supply

机译:一种直接的方法,用于通过一步溅射工艺制备黄铜矿CIGS薄膜而无需额外的供应

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Chalcopyrite Cu(In, Ga)Se2 (CIGS) films were directly fabricated by using one-step sputtering from a single quaternary target even without extra Se supply during deposition or post selenization treatment. Structural and electrical properties have been investigated. Cu2-xSe phase was usually observed in the as-deposited samples. However, such second phase could be removed by KCN treatment. Our results showed that the CIGS absorber layer prepared by our one-step sputtering process exhibited columnar structure with (112) preferred orientation and the device revealed an efficiency of 8.01%.
机译:即使在沉积期间或后硒化治疗期间,即使在没有额外的SE供应或后硒化处理中,通过使用从单次季度靶的一步溅射直接制造ChalcoPyroite Cu(CIGS)膜。 已经研究了结构和电性能。 通常在沉积的样品中观察到Cu2-XSe期。 然而,这种第二阶段可以通过KCN治疗除去。 我们的结果表明,通过我们的一步溅射工艺制备的CIGS吸收层表现出具有(112)优选取向的柱状结构,并且该装置显示出8.01%的效率。

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