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Suppression of Kirkendall voiding in Sn-3.5Ag/Cu solder joints by preannealing process

机译:通过预退火工艺抑制Sn-3.5Ag / Cu焊点中的Kirkendall空隙

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In this study, electroplated Cu films were pre-annealed at T (T = 673, 773, 873 K) for varying times.Sn-3.5Ag solder reflowed over the Cu films and subsequently aged at 150°C for 240 hrs. Effects of preannealingon the microstructure of Cu films, as well as contents of organic impurities incorporated in theCu films were investigated. After solder reflow, the formation of Kirkendall voids at Cu_3Sn/Cu interfacewas observed from SEM micrographs. Results show that the pre-annealing process significantlysuppressed Kirkendall void formation in the Sn-3.5Ag/Cu solder joints. A line fraction of voids at theCu_3Sn/Cu interface was definitely suppressed in the case of 500°C and 600°C pre-annealed samplescompared to as-deposited Cu sample. SIMS analyses revealed that pre-annealing reduced the level ofimpurities in the Cu films, especially S and C. The mechanism of suppressing Kirkendall voids at theCu_3Sn/Cu interface was presented by schematic diagram, and it could be seen that pre-annealing methodhas a potential to enhance solder joint reliability.
机译:在这项研究中,电镀铜膜在T(T = 673,773,873 K)下进行了不同时间的预退火处理。 Sn-3.5Ag焊料在Cu膜上回流,随后在150°C时效240小时。预退火的效果 铜膜的微观结构,以及其中所含有机杂质的含量 研究了铜膜。焊料回流后,在Cu_3Sn / Cu界面处形成了Kirkendall空隙 从SEM显微照片观察到。结果表明,预退火过程明显 抑制了Sn-3.5Ag / Cu焊点中的Kirkendall空隙形成。空隙处的线部分 在500°C和600°C的预退火样品中,Cu_3Sn / Cu界面确实受到抑制 与沉积后的铜样品相比。 SIMS分析显示,预退火降低了合金的含量 Cu膜中的杂质,特别是S和C。 通过示意图给出了Cu_3Sn / Cu界面,可以看出预退火方法 有潜力提高焊点的可靠性。

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