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首页> 外文期刊>Journal of Applied Physics >Electromigration induced Kirkendall void growth in Sn-3.5Ag/Cu solder joints
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Electromigration induced Kirkendall void growth in Sn-3.5Ag/Cu solder joints

机译:电迁移引起锡-3.5Ag / Cu焊点中的Kirkendall空隙增长

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摘要

Effects of electric current flow on the Kirkendall void formation at solder joints were investigated using Sn-3.5Ag/Cu joints specially designed to have localized nucleation of Kirkendall voids at the Cu_3Sn/Cu interface. Under the current density of 1 × 10~4A/cm~2, kinetics of Kirkendall void growth and intermetallic compound thickening were affected by the electromigration (EM), and both showed the polarity effect. Cu_6Sn_5 showed a strong susceptibility to the polarity effect, while Cu_3Sn did not. The electromigration force induced additional tensile (or compressive) stress at the cathode (or anode), which accelerated (or decelerated) the void growth. From the measurements of the fraction of void at the Cu_3Sn/Cu interface on SEM micrographs and analysis of the kinetics of void growth, the magnitude of the local stress induced by EM was estimated to be 9 MPa at the anode and -7 MPa at the cathode.
机译:使用专门设计用于在Cu_3Sn / Cu界面上局部形成Kirkendall空隙的Sn-3.5Ag / Cu接头,研究了电流对焊点处Kirkendall空隙形成的影响。在1×10〜4A / cm〜2的电流密度下,电迁移(EM)影响了Kirkendall空穴生长和金属间化合物增稠的动力学,并且都显示出极性效应。 Cu_6Sn_5对极性效应表现出较强的敏感性,而Cu_3Sn没有。电迁移力在阴极(或阳极)处引起额外的拉伸(或压缩)应力,从而加速(或减速)空隙的生长。通过在SEM显微照片上测量Cu_3Sn / Cu界面处的空隙率并分析空隙生长的动力学,估计由EM引起的局部应力的大小在阳极处为9 MPa,在阳极处为-7 MPa。阴极。

著录项

  • 来源
    《Journal of Applied Physics 》 |2014年第8期| 083708.1-083708.9| 共9页
  • 作者

    Yong Jung; Jin Yu;

  • 作者单位

    Department of Materials Science and Engineering, Electronic Packaging Laboratory, KAIST, 373-1 Guseong-dong, Yuseong-gu, Daejeon 305-701, South Korea;

    Department of Materials Science and Engineering, Electronic Packaging Laboratory, KAIST, 373-1 Guseong-dong, Yuseong-gu, Daejeon 305-701, South Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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