首页> 外文会议>Proceedings of the 8th Spanish Conference on Electron Devices >Threshold voltage model for ion-implanted short gate-length GaAs MESFETs under dark and illuminated conditions
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Threshold voltage model for ion-implanted short gate-length GaAs MESFETs under dark and illuminated conditions

机译:在黑暗和光照条件下离子注入的短栅长GaAs MESFET的阈值电压模型

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In the present work, an attempt has been made to analytically model the threshold voltage of short-channel optically controlled GaAs MESFETs with a vertical Gaussian profile. The two-dimensional (2D) Poisson''s equation has been solved with suitable boundary conditions using superposition method to obtain an optical radiation dependent threshold voltage expression. The credibility of the model is established by comparison of the calculated threshold voltage with the numerical simulation data obtained by ATLAS™ device simulator.
机译:在本工作中,已经尝试对具有垂直高斯分布的短通道光控GaAs MESFET的阈值电压进行分析建模。已使用叠加方法在适当的边界条件下求解了二维(2D)泊松方程,以获得依赖于光辐射的阈值电压表达式。通过将计算出的阈值电压与ATLAS™设备模拟器获得的数值模拟数据进行比较,可以建立模型的可信度。

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