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ADVANCED SIMULATION/MODELING AND RELIABILITY OF FINE PITCH (130um) LEAD-FREE FLIP-CHIP PACKAGE

机译:精细音高(130um)无铅倒装芯片封装的先进仿真/建模和可靠性

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Flip-chip technology has been introduced in recent years which accommodate the ever increasing demands for higher performance and I/O density, while achieving smaller form factor and offering a cost effective solution. As the industry moves toward the 65nm and 45nm technology node, die sizes require a significant reduction while accommodating the need for tighter and finer pitches. For decades, the C4 process has served as the main interconnect method in the flip-chip package. But with bump pitches shrinking, the solder bump based C4 process is facing challenges in terms of reducing pitch and underfill process. At the same time, increasing challenges for flip-chip are seen by the movement toward lead-free solder bumps and low-k dielectric layers. This work conducted simulations and analyses on Tessera developmental μPILR flip chip package incorporating a 130um pitch bump array, using 3-D finite element method (FEM). This study explores the effect of various design parameters on package reliability while providing suggestions for selecting packaging materials. Based on modeling data certain set of over mold, underfill and thermal interface materials enhance overall package reliability performance. Solder fatigue life prediction was performed and solder bump reliability was compared for Tessera flip chip technology and standard flip chip solder joints using Modified Anand solder material properties and Darveaux fatigue life prediction theory. Further more, fracture mechanics approach was applied, and energy release rates were obtained in order to check reliability of low-k dielectric layer, provided passive/low-k material selection. The data presented here provides a baseline for reliability/feasibility of Tessera developmental uPILR flip chip package design for 130um bump pitch. Experimental reliability data is not complete at this time but will be available and published soon.
机译:近年来介绍了倒装芯片技术,可容纳更高的性能和I / O密度的需求,同时实现较小的形状因素并提供具有成本效益的解决方案。随着行业走向65nm和45nm的技术节点,模具尺寸需要显着的减少,同时适应更细并更细的间距。几十年来,C4过程已经用作倒装芯片封装中的主要互连方法。但随着凸起间距缩小,基于焊料的C4过程在减少间距和底部填充过程方面面临挑战。同时,通过向无铅焊料凸块和低k介电层的运动来看看倒装芯片的挑战。这项工作进行了使用3-D有限元方法(FEM)的仿真和分析TESSERA发育μPILR倒装芯片包装,其包含130um螺距凸墨阵列。本研究探讨了各种设计参数对包装可靠性的影响,同时提供了用于选择包装材料的建议。基于建模数据,填充和热界面材料的某些集合,提高了整体包装可靠性性能。进行焊料疲劳寿命预测,使用改进的Anand焊料特性和Darveaux疲劳寿命预测理论比较焊接抗芯片技术和标准倒装芯片焊点的焊料凸块可靠性。此外,施加裂缝力学方法,获得能量释放速率以检查低k介电层的可靠性,提供无源/低k材料选择。本文提供的数据为TESSERA发育型UPILR倒装芯片封装设计提供了130um凸起的可靠性/可行性的基线。实验可靠性数据此时不完整,但将可用并很快发布。

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