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Photoluminescence and cathodoluminescence of GaN doped with Pr

机译:GaN的光致发光和阴极发光掺杂有PR

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In this paper we have reported the observation of visible photoluminescence (PL) and cathodoluminescence (CL) of Pr implanted in GaN. The implanted samples were given isochronal thermal annealing treatments at a temperature of 1100 deg C in NH_3, N_2, Ar_2, and in forming gas N_2+H_2, at atmospheric pressure to recover implantation damages and activate the rate earth ions, The sharp characteristic emission lines corresponding to Pr~(3+) intra-4f~n-shell transitions are resolved in the spectral range from 350 nm to 1150 nm, and observed over the temperature range of 12 K-335 K. The PL and CL decay kinetics measurement was performed for ~3P_1, ~3P_0 and ~1D_2 levels.
机译:在本文中,我们报道了在GaN中植入的Pr的可见光致发光(PL)和阴极致发光(Cl)的观察。在NH_3,N_2,AR_2和在大气压下在NH_3,N_2,AR_2和形成气体N_2 + H_2时,将植入样品在1100℃,N_2 + H_2的温度下给予同胞的热退火处理,以回收植入损坏并激活速率地面离子,尖锐的特征排放线对应于PR〜(3+)的4F〜N-壳转变在350nm至1150nm的光谱范围内分解,并且在12k-33​​5k的温度范围内观察到PL和CL衰变动力学测量执行〜3p_1,〜3p_0和〜1d_2级。

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