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Characterisation of GaN using cathodoluminescence and photoluminescence spectroscopy

机译:用阴极发光和光致发光光谱表征GaN

摘要

The electron beam used to generate SEM images often results in the emission of light (cathodoluminescence). If the luminescence is detected, a new and distinctive image of the sample is produced. This new CL-SEM image distinguishes regions of high and low luminescence efficiency. Cathodoluminescence spectroscopy is an irreplaceable research tool as it allows the researcher to obtain a correlation between structural and optical properties and well as providing high spatial resolution of the luminescence distribution in the sample.ududIn this study we apply CL-SEM to the study of GaN. Normal hétéroépitaxial growth of GaN on substrates such as AI2O3 leads to a columnar material consisting of many hexagonal grains. The tilt and rotation of the grains result in a high dislocation density of the order of 1010 cm'2. The effect of this high dislocation density on the luminescence efficiency was studied. In the Epitaxial Lateral Overgrowth (ELO) process, the material grows vertically through the etched windows in the SiOa mask and then laterally over the mask. This leads to a reduction in the dislocation density by three to four orders of magnitude. The results reported here confirm that the luminescence efficiency is substantially higher for ELO material.ududWe report also on photoluminescence measurements of a blue defect band in GaN which has received considerably less attention than the characteristic yellow band. The blue band appears for samples cooled in the dark, and it disappears under illumination at a rate that depends on temperature. We analyse the decrease in the blue luminescence and a corresponding increase of the yellow band as a function of time at a range of temperatures and suggest possible explanations for the complex nature of the metastability displayed by the defect responsible for the blue band.
机译:用于生成SEM图像的电子束通常会导致光发射(阴极发光)。如果检测到发光,则产生样品的新的独特图像。此新的CL-SEM图像区分了高和低发光效率的区域。阴极发光光谱法是不可替代的研究工具,因为它使研究人员能够获得结构与光学性质之间的相关性,并提供样品中发光分布的高空间分辨率。 ud ud在本研究中,我们将CL-SEM应用于研究GaN。 GaN在Al2O3等衬底上的正常外延生长会导致由许多六角形晶粒组成的柱状材料。晶粒的倾斜和旋转导致大约1010 cm'2的高位错密度。研究了这种高位错密度对发光效率的影响。在外延横向过度生长(ELO)工艺中,材料通过SiOa掩模中的蚀刻窗口垂直生长,然后在掩模上横向生长。这导致位错密度降低三到四个数量级。此处报道的结果证实了ELO材料的发光效率明显更高。 ud ud我们还报道了GaN中蓝色缺陷带的光致发光测量结果,该缺陷的发生率远低于特征性黄色带。在黑暗中冷却的样品会出现蓝带,并且在照明下以取决于温度的速率消失。我们分析了在一定温度范围内,蓝色发光的减少以及相应的黄带随时间的变化,并提出了可能的解释来解释由造成蓝带的缺陷所引起的亚稳态的复杂性。

著录项

  • 作者

    Ryan Brendan;

  • 作者单位
  • 年度 2003
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  • 原文格式 PDF
  • 正文语种 en
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