dielectric thin films; cerium compounds; aluminium; leakage currents; semiconductor device breakdown; rapid thermal annealing; Poole-Frenkel effect; tunnelling; band structure; EOT; gate leakage current temperature dependence; substrate injection; ultra-thin cerium dioxide films; high breakdown voltage; time-dependent-dielectric-breakdown; TDDB; high temperature annealing; carrier transportation; gate dielectrics; rapid thermal annealing; carrier conduction mechanisms; Frenkel-Poole conduction; Fowler-Nordheim tunneling; energy band diagram; Al-CeO/sub 2/-Si;
机译:快速热退火CeO_2栅介质的载流子传输
机译:稀蒸汽快速热氧化生长并在一氧化氮中退火的氧氮化物栅极电介质的电学和可靠性特征
机译:氮气中脉冲激光沉积制备HfO2薄膜栅介质的界面反应和电性能:快速热退火和栅电极的作用
机译:快速热退火改善CeO 2 sub>栅介质的特性和载流子传输
机译:快速热CVD高k栅极电介质和CVD金属栅电极的技术开发和研究,用于未来的ULSI MOSFET器件集成:氧化锆和氧化ha。
机译:通过快速热退火改善1.3μmInAs / GaAs量子点激光器中的基态调制特性
机译:热退火对以ZrO2为栅极电介质的玻璃上CuPc薄膜晶体管电特性的影响
机译:用压电光热光谱研究退火对alGaas / Gaas中非辐射载流子复合的影响。