RAPID THERMAL ANNEALING FURNACE FOR REDUCING RAPID COOLING AND HEATING TEMPERATURES AND FACILITATING MAINTENANCE OF THE THERMAL ANNEALING FURNACE

摘要

PURPOSE: A rapid thermal annealing furnace is provided to for a plurality of insulating layers to thereby freely control temperature very fast in a temperature range of 150 to 1000°. ;CONSTITUTION: A rapid thermal annealing furnace comprises a semicircular IR lamp(1), a quartz guide, and a thermal insulation material(5,6). The semicircular IR lamp is composed in a heating element form on the inner surface of a thermal insulation layer. The quartz guide prevents drooping. The insulating material is separated based on an insulator. The insulating material is layered at an angle of 90°. The insulating material forms an air hole for supplying air in the lowest insulation layer. The insulating material forms an exhaust hole(4b) for controlling internal pressure and temperature in the highest insulation layer.;COPYRIGHT KIPO 2011