Thermally induced viscous flow of borophosphosilicate-glass thin films on stepped surfaces - Part 1: a review of quantitative studies on furnace and rapid thermal annealing

摘要

The results are reviewed of studies on the thermally induced viscous flow of borophosphosilicateglass thin films, which are used as premetal dielectrics in ICs of micrometer or submicrometer feature size. Part I is concerned with experiments on the furnace annealing and rapid thermal annealing of the films. A quantitative approach to the description of thermal glass flow is discussed. Factors affecting the accuracy of the formulas are considered.