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Qualification of Low-k 65nm Technology Die with Pb-free Bumps on a 2-2-2 Laminate Package (PBGA) with Pb-free Assembly Processes

机译:具有无铅组装工艺的2-2-2层压封装(PBGA)上具有无铅凸点的Low-k 65nm技术芯片的资格鉴定

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Flip-chip carriers have become the preferred solution for high-performance ASIC and microprocessor devices. Typically these are packaged in organic or ceramic Ball Grid Array (BGA) connections. Recently, there has been a significant focus on Pb-free packages to meet European Union mandated RoHS guidelines by 2006, with exemptions allowed for server and other networking hardware (1,2). Towards this goal, IBM has developed and qualified Pb-free and Pb-reduced packages that cover advanced semiconductor technologies such as 130nm and 90nm ground rules. In addition, for device performance reasons, the BEOL wiring layers on the high-performance 90nm or smaller ground rule devices also require low-k dielectric materials. Finally, due to tighter wiring ground rules and faster device performance requirements, the build-up laminate packages require thincore (400 um) and advanced wiring pitch in the build-up layers. IBM has partnered with Amkor Technology to qualify both 130nm and 90nm devices with Amkor developed Pb-free bumps using large die and build-up laminates, the details of which were presented at the 56th ECTC (3). The Sn-Ag Pb-free plated bumps were fabricated by Amkor on 300mm wafers with photosensitive polyimide (PSPI) passivation. Details of Amkor-Unitive plated Pb-free bump technology are discussed in Reference 4. The die size used was 14.7mm and the laminate qualified was 42.5mm with a structure of 4-2-4. We have extended the Pb-free low-k device technology to evaluate two additional elements: 65nm ground rules with enhanced low-k wiring layers on the die, and a 2-2-2 structure with thin core.
机译:倒装芯片载体已经成为高性能ASIC和微处理器设备的首选解决方案。通常,这些封装为有机或陶瓷球栅阵列(BGA)连接。最近,人们非常关注无铅封装,以在2006年前达到欧盟授权的RoHS准则,并且允许对服务器和其他网络硬件进行豁免(1,2)。为了实现这一目标,IBM已经开发并认证了无铅和降低铅含量的封装,这些封装涵盖了先进的半导体技术,例如130nm和90nm基本规则。此外,出于设备性能的考虑,高性能90nm或更小的接地规则设备上的BEOL布线层也需要低k介电材料。最后,由于更严格的布线接地规则和更快的设备性能要求,因此积层板封装需要积层中的薄芯(400 um)和先进的布线间距。 IBM已与Amkor Technology合作,通过使用大型裸片和积层层压板的Amkor开发的无铅凸块来对130nm和90nm器件进行鉴定,其详细信息在第56届ECTC上进行了介绍(3)。 Amkor通过光敏聚酰亚胺(PSPI)钝化在300mm晶圆上制造了无Sn-Ag无铅电镀凸块。参考文献4中详细介绍了Amkor-Unitive电镀无铅凸块技术。所使用的芯片尺寸为14.7mm,合格的层压板为42.5mm,结构为4-2-4。我们已经扩展了无铅低k器件技术,以评估另外两个元素:在裸片上具有增强的低k布线层的65nm接地规则以及具有薄芯的2-2-2结构。

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