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Electrical Characteristics of 4H-SiC pn Diode Grown by LPE Method

机译:LPE法生长的4H-SiC pn二极管的电学特性

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摘要

Electrical characteristics of 4H-SiC pn diodes fabricated by liquid phase epitaxy (LPE) were investigated. Current-voltage (I-V) and capacitance voltage (C-V) characteristics of the pn junction were measured in the temperature range from 300 to 700 K and at different frequencies, respectively. Analysis of the C-V data indicates the existence of a thin transient (defect) layer between p- and n-layers of the pn junction. Analysis of I-V data showed that the defect layer limits the forward current. The forward I-V characteristics might be described by the tunnelling-recombination model, in which it is assumed that the conduction electrons form an n-layer tunnel into the available band-gap states located in the defect layer and then fall into the valence band of the p-layer.
机译:研究了液相外延(LPE)制备的4H-SiC pn二极管的电学特性。在300至700 K的温度范围内以及在不同的频率下分别测量pn结的电流-电压(I-V)和电容电压(C-V)特性。对C-V数据的分析表明,在pn结的p层和n层之间存在一个薄的瞬态(缺陷)层。 I-V数据分析表明,缺陷层限制了正向电流。前向IV特性可以用隧穿复合模型来描述,在该模型中,假设传导电子从n层隧穿进入位于缺陷层的可用带隙态,然后落入价电子的价带。 p层。

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