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4H-SiC pn Diode Grown by LPE Method for High Power Applications

机译:LPE方法生长的4H-SiC pn二极管,用于大功率应用

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摘要

The current-voltage (I-V) characteristics of large area (5 mm~2) 4H-SiC pn diodes fabricated by liquid phase epitaxy (LPE) were studied up to 2 kA/cm~2 in the temperature range from 20 to 300℃. At 200 A/cm and room temperature, the forward voltage drop (V_F) was measured to be 3.7 V. The specific on-state resistance (R_(on)) was found to be (2.3-3.4) mΩ·cm~2. The V_F showed a negative temperature coefficient in the investigated region. The long-term stability testing of the pn diodes during 100 hr at forward current density of 200 A/cm~2 was performed. The V_F increased by 0.2 V with time. Deep traps were investigated before and after long-term testing. A deep trap with thermal activation energy of E_C-1.43+-0.03 eV was detected after diode operation during 20 hr at 200 A/cm~2. It is speculated that this deep trap determines the degradation of electrical characteristics.
机译:在20至300℃的温度范围内,对高达2 kA / cm〜2的液相外延(LPE)制备的大面积(5 mm〜2)4H-SiC pn二极管的电流-电压(I-V)特性进行了研究。在室温和200 A / cm的条件下,测得的正向压降(V_F)为3.7V。比通态电阻(R_(on))为(2.3-3.4)mΩ·cm〜2。 V_F在研究区域显示负温度系数。对正向电流密度为200 A / cm〜2的pn二极管进行了100个小时的长期稳定性测试。 V_F随时间增加0.2V。在长期测试之前和之后,对深陷阱进行了调查。在200 A / cm〜2的二极管工作20小时后,检测到一个深热阱,其热活化能为E_C-1.43 + -0.03 eV。据推测,该深陷阱决定了电特性的劣化。

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