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Energy-Band Structure of Strained Indirect Gap Semiconductor: A k. p Method

机译:应变间接间隙半导体的能带结构:A k。 p法

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摘要

A strain Hamiltonian H_(st), associated with a sps~* k. p Hamiltonian H_(kp), is used to describe the valence band and the first two conduction bands of a strained indirect semiconductor. H_s, takes into account the Bir-Pikus parameters (a, b) used up to now to describe only the Brillouin zone center. The H_(kp)+H_(st), Hamiltonian allows one to calculate the energy dispersion all over the Brillouin zone. The method is applied to Si strained on Si_(1-x)Ge_x alloy. We do not use the local (in k space) deformation potentials Ξ_u and Ξ_d conventionally used in indirect gap semiconductor to describe the conduction band. The energy band gap, the conduction bands split into the four equivalent in-plane valleys Δ_4 and the two valleys along the growth direction Δ_2 which result from the above H_(kp)+H_(st) Hamiltonian are in very good agreement with other publications.
机译:与sps〜* k相关的应变哈密顿量H_(st)。 p哈密顿量H_(kp)用于描述应变间接半导体的价带和前两个导带。 H_s考虑了到现在为止仅用来描述布里渊区域中心的Bir-Pikus参数(a,b)。 H_(kp)+ H_(st)哈密顿量允许人们计算整个布里渊区的能量色散。该方法适用于应变在Si_(1-x)Ge_x合金上的Si。我们没有使用间接间隙半导体中通常用来描述导带的局部(在k空间中)形变电势Ξ_u和Ξ_d。由上述H_(kp)+ H_(st)哈密顿量产生的能带隙,导带分为四个等效面内谷Δ_4和沿生长方向Δ_2的两个谷与其他出版物非常吻合。

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