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New Developments in Wire Bonding for Future Packages

机译:未来封装的引线键合的新发展

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In recent years the bonding wire market has been moving to ultra fine wires below 23μm. The world wide average diameter has moved from 26.5μm in 2002 to 25.2μm in 2006. Leading edge applications are now using 18μm in mass production. Driving forces are the decreasing package size and the trend to multifunctional,highly integrated packages like SiP or SoP. Also cost reduction programs have a serious influence on wire diameter reduction. In terms of bonding wires the diameter must be reduced while keeping high tensile strength and good bondability. Also reliability must be ensured. Consequently the wire properties must be adjusted for all the new application. rnThis paper will focus on the recent development of new bonding wire types for high reliability as well as for fine pad pitch (50-60 μm) application. The influence of dopants to adjust material properties will be shown for different gold wire types of various grades from 99 to 99.99 % gold content. State of the art analytical investigation methods are used to determine high resolution cross sections of interconnections in order to obtain a better understanding of intermetallic phase growth phenomena. Results for typical tests like high temperature storage test will be shown. The technological barrier of bonding wires as well as future challenges will be discussed. This includes mechanical as well as materials points of view. An outlook for future potential emerging technologies e.g. room temperature bonding of gold wire,use of aluminum ribbons will be given.
机译:近年来,键合线市场已转向23μm以下的超细线。全世界的平均直径已从2002年的26.5μm增长到2006年的25.2μm。前沿应用现在正在大规模生产中使用18μm。驱动力是减小封装尺寸以及向多功能,高度集成的封装(如SiP或SoP)发展的趋势。降低成本的计划也严重影响了线径的减小。就接合线而言,必须在保持高抗拉强度和良好接合性的同时减小直径。还必须确保可靠性。因此,必须针对所有新应用调整导线属性。 rn本文将重点关注新型键合线的最新开发,以实现高可靠性以及精细的焊盘间距(50-60μm)应用。对于金含量从99%到99.99%的不同等级的不同金线类型,将显示掺杂剂对调节材料性能的影响。为了获得对金属间相生长现象的更好的了解,使用了最先进的分析研究方法来确定互连的高分辨率横截面。将显示典型测试的结果,例如高温存储测试。将讨论键合线的技术壁垒以及未来的挑战。这包括机械和材料的观点。未来潜在新兴技术的前景常温下使用金线,可使用铝带。

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