Solid State Physics Section, University of Athens, Panepistimiopolis Zografos, Athens 15784,Greece;
Solid State Physics Section, University of Athens, Panepistimiopolis Zografos, Athens 15784,Greece;
Solid State Physics Section, University of Athens, Panepistimiopolis Zografos, Athens 15784,Greece;
Insitute of Electron Technology, Al.Lotnikow 02 668, Warsaw, Poland;
Ioffe Physicothechnical Institute of the Russian Academy of Sciences, Politeknicheskaya ul. 26194021 St Petersburg, Russia;
Kumamoto National College of Technology, 26592, Nishigoshi, Kumamoto 8611102, Japan;
Ge-doped Si; point defects; electron irradiation; IR spectroscopy;
机译:锗掺杂Cz-Si中VO_n,C_iO_i和C _iC_s缺陷的IR研究
机译:通过Ge和Pb掺杂对Si进行工程VO,C_iO_i和C_iC_s缺陷
机译:高应力退火后的掺Ge的Cz-Si缺陷
机译:GE-DOPED CZ-SI中的VO_N,C_IO_I和C_IC_S缺陷的IR研究
机译:磷酸锆锗和黄铜矿中缺陷电子结构的第一性原理研究。
机译:孕妇妊娠早期尿路感染的抗生素使用与出生缺陷之间的关联全国出生缺陷预防研究1997年至2011年
机译:阴极发光法研究掺锗辐照光纤的点缺陷
机译:Ge掺杂CH的IR特性 - a连续性