首页> 外文会议>Gettering and defect engineering in semiconductor technology XIV >Formation of Copper-Related Deep-Level Centers in Irradiated p-Type Silicon
【24h】

Formation of Copper-Related Deep-Level Centers in Irradiated p-Type Silicon

机译:辐射的p型硅中与铜有关的深层中心的形成

获取原文
获取原文并翻译 | 示例

摘要

Results of a DLTS study on the deep-level centers in the copper-contaminated electron-irradiated FZ-Si are presented. Copper was diffused from the Cu-contaminated surface into previously irradiated samples at 350 K. The most abundant Cu-related complexes formed due to this procedure are the same as in the case of previously studied Cu-diffused Cz-Si.
机译:提出了对铜污染的电子辐照的FZ-Si的深层中心进行DLTS研究的结果。铜在350 K的温度下从受铜污染的表面扩散到先前辐射的样品中。由于此过程而形成的最丰富的与铜有关的络合物与先前研究的经铜扩散的Cz-Si相同。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号