imec, Kapeldreef 75, 3001 Leuven, Belgium;
imec, Kapeldreef 75, 3001 Leuven, Belgium;
imec, Kapeldreef 75, 3001 Leuven, Belgium;
Also Katholieke Universiteit Leuven, ESAT-INSYS division, 3000 Leuven, Belgium;
Also Katholieke Universiteit Leuven, ESAT-INSYS division, 3000 Leuven, Belgium;
Also Post-doctoral fellow of the Fund for Scientific Research-Flanders (FWO), 1000 Brussels, Belgium;
Also Katholieke Universiteit Leuven, ESAT-INSYS division, 3000 Leuven, Belgium;
imec, Kapeldreef 75, 3001 Leuven, Belgium;
imec, Kapeldreef 75, 3001 Leuven, Belgium;
Also at Instituut voor Kern- en Stralingsfysica, K. U. Leuven, 3001 Leuven, Belgium;
imec, Kapeldreef 75, 3001 Leuven, Belgium;
imec, Kapeldreef 75, 3001 Leuven, Belgium;
机译:HfO_2 / TiN栅极金属氧化物半导体场效应晶体管中的电子迁移率分析:HfO_2厚度,温度和氧化物电荷的影响
机译:原子层沉积的TaC_y金属栅极:对HfO_2高k电介质的微观结构,电性能和功函数的影响
机译:双层(sio_2 / hfo_2)栅极电介质N型金属氧化物半导体场效应晶体管中电活性缺陷的空间分布
机译:具有HFO / TIN金属栅极GE-PFET的电气表征:审查影响空穴移动性的可能缺陷
机译:电和热感应物理缺陷对AlGaN / GaN高电子迁移率晶体管的可靠性的影响。
机译:CF4等离子体处理HfO2栅电介质的非晶铟镓锌氧化物薄膜晶体管的电性能和可靠性提高
机译:HfO2 / TiN栅极金属氧化物半导体场效应晶体管中的电子迁移率分析:HfO2厚度,温度和氧化物电荷的影响