MEMS/MOEMS failure location and characterization methods: The Micromirror Device

摘要

The purpose of this paper is to illustrate the approaches used to determine the location, character and origin of failed superstructure elements within the Digital Micromirror Device and relationally to other types of MEMS and MOEMS devices. Since the Digital Micromirror Device is a very large field of movable mirrors that are essentially identical in appearance, some of those methods will include the uses of: failure mapping, digital imaging techniques and explanations of precautions needed to ensure the result of the analysis is a correct answer to the questions asked. SUBJECT: The subject of this paper is to discuss the methods available to localize the failed location within a highly repetitive design matrix of reflective mirrors in an X/Y arrangement. OBJECTIVE: My objective is to show that several approaches are available to allow the failure analyst to isolate and document the failure locations within a large (Approximately 0.75 inches on a side) die area.