MAPPER: High throughput maskless lithography

摘要

MAPPER Lithography is developing a maskless lithography technology based on massively-parallel electron-beam writing with high speed optical data transport for switching the electron beams. In this way optical columns can be made with a throughput of 10-20 wafers per hour. By clustering several of these systems together high throughputs can be realized in a small footprint. This enables a highly cost-competitive alternative to double patterning and EUV alternatives [1].rnIn 2009 MAPPER shipped two systems one to TSMC and one to CEA-Leti. Both systems will be used to verify the applicability of MAPPER's technology for CMOS manufacturing.rnThis paper presents a status update on the development of the MAPPER system over the past year. First an overview will be presented how to scale the current system to a 10 wph machine which can consequently be used in a cluster configuration to enable 100 wph throughputs.rnThen the results of today's (pre-) alpha systems with 300 mm wafer capability are presented from the machines at MAPPER, TSMC and CEA-Leti.