Organic ArF Bottom Anti-Reflective Coatings for Immersion Lithography

摘要

Substrate reflectivity control plays an important role in immersion lithography. Multi-layer bottom anti-reflective coatings (B.A.R.C.s) become necessary. This paper will focus on the recent development in organic ArF B.A.R.C. for immersion lithography. Single layer low k ArF B.A.R.C.S in conjunction with multilayer CVD hard mask and dual layer organic ArF B.A.R.C. application will be discussed. High NA dry and wet lithography data will be presented. We will also present the etch rate data, defect data and out-gassing property of these new B.A.R.C. materials.