POLYMER RESIN FOR ORGANIC BOTTOM ANTI-REFLECTIVE COATING FILM AND ORGANIC BOTTOM ANTI-REFLECTIVE COATING COMPOSITIONS FOR KrF PHOTORESIST USING THE SAME

摘要

PURPOSE: A polymer resin for an organic anti-reflective coating and an organic anti-reflective coating composition for KrF photoresist using the polymer resin are provided to raise etch rate and increase solubility so as to improve coating uniformity and prevent generation of impurities or defects on the surface of the coating. CONSTITUTION: A polymer resin for an organic anti-reflective coating is formed through radical polymerization having a compound for a light absorber. An organic anti-reflective coating composition includes the polymer resin, an organic solvent, a thermal acid generator and a cross linking agent. The organic anti-reflective coating composition is coated on a silicon wafer or an aluminum substrate using a spin coater, to form an anti-reflective coating. After the coating, the anti-reflective coating is heated at 190-240 degrees centigrade.