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The refractive index and absorbance of aqueous and organic fluids for immersion lithography.

机译:用于浸没式光刻的水性和有机液体的折射率和吸收率。

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摘要

The semiconductor industry is continually challenged to maintain the trend identified in 1965 by Gordon Moore of increasing the density of transistors on an integrated circuit. These advances have been achieved by increasing the resolution that can be printed with photolithography, traditionally by decreasing the exposure wavelength. Decreasing the exposure wavelength from 193 nm, the current state of the art, presents significant technical challenges. To circumvent these challenges, resolution can be increased by enabling increases in numerical aperture (without changing the exposure wavelength), using immersion lithography. In immersion lithography, the air gap between the photoresist-coated wafer and lens is replaced with a high refractive index fluid. Immersion lithography has been demonstrated with water as the immersion fluid. With water immersion lithography at 193 nm, the maximum resolution that can be printed can be decreased from 65 nm to 45 nm. To enable further resolution increases, immersion fluids with a higher index than water are needed. The requirements for next generation high index fluids are: an index of refraction higher than water, high transparency, and physical properties similar to water.;A variety of methods to identify a high index fluid were completed. First, the optical properties of aqueous solutions of metal cations with varying anions were tested. A series of linear, cyclic, and polycyclic alkanes were also studied, since saturated systems have electronic transitions at wavelengths less than 200 nm, to provide the necessary transparency at 193 nm. Large alkane groups were also incorporated into either the cation or anion of a salt to develop an aqueous solution with the optical properties of a saturated hydrocarbon. In addition to these empirical surveys, a modeling approach was used to develop "designer" absorbance spectra that would correspond to fluids with a high index and low absorbance at 193 nm.;Additionally, in Appendix D, the results of an electrochemical study of the diffusion coefficient of ferrocene methanol in poly(ethylene glycol) diacrylate hydrogels of varying molecular weight and water content will be presented. The results of these mass transport studies can be used to qualitatively understand the mass transport characteristics of additional species in the hydrogel.
机译:保持Gordon Moore在1965年提出的增加集成电路上晶体管密度的趋势一直是半导体行业面临的挑战。这些进步是通过提高光刻可以印刷的分辨率,传统上是通过减小曝光波长来实现的。当前的现有技术将曝光波长从193 nm减小,提出了重大的技术挑战。为了避免这些挑战,可以使用浸没式光刻技术通过增加数值孔径(不改变曝光波长)来提高分辨率。在浸没式光刻中,用高折射率的流体代替涂有光刻胶的晶片和透镜之间的气隙。已经证明了使用水作为浸没液的浸没式光刻。使用193 nm的水浸光刻技术,可以打印的最大分辨率可以从65 nm降低到45 nm。为了进一步提高分辨率,需要浸入液的折射率比水高。对下一代高折射率流体的要求是:折射率高于水,高透明度以及类似于水的物理特性。完成了多种识别高折射率流体的方法。首先,测试了具有不同阴离子的金属阳离子水溶液的光学性能。还研究了一系列线性,环状和多环烷烃,因为饱和系统在小于200 nm的波长下具有电子跃迁,从而在193 nm处提供必要的透明度。还将大的烷烃基团掺入盐的阳离子或阴离子中以形成具有饱和烃光学性质的水溶液。除了这些经验调查外,还使用一种建模方法来开发“设计器”吸光度光谱,该光谱对应于在193 nm处具有高折射率和低吸光度的流体。此外,在附录D中,对电化学法进行了研究。提出了不同分子量和水含量的二茂铁甲醇在聚(乙二醇)二丙烯酸酯水凝胶中的扩散系数。这些传质研究的结果可用于定性地了解水凝胶中其他物质的传质特性。

著录项

  • 作者

    Costner, Elizabeth A.;

  • 作者单位

    The University of Texas at Austin.;

  • 授予单位 The University of Texas at Austin.;
  • 学科 Engineering Chemical.
  • 学位 Ph.D.
  • 年度 2009
  • 页码 301 p.
  • 总页数 301
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-17 11:37:47

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