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Passivation Effect on Channel Recessed 4H-SiC MESFETs

机译:钝化对沟道嵌入式4H-SiC MESFET的影响

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摘要

Channel recessed 4H-SiC MESFETs were fabricated and have demonstrated excellent small signal characteristics, such as, F_t of 14.5 GHz and F_(max) of 40 GHz (for MAG = 1). The effect of Si_3N_4 passivation on these devices has been studied in this work. Current instability and RF power performance were improved after passivation. From our measurements, we found out that the passivation of SiC MESFETs reduces the surface effects and improves the RF power performance by suppressing the instability in DC characteristics.
机译:制造了沟道凹入4H-SiC MESFET,并展示了出色的小信号特性,例如14.5 GHz的F_t和40 GHz的F_(max)(对于MAG = 1)。在这项工作中已经研究了Si_3N_4钝化对这些器件的影响。钝化后,电流不稳定性和RF功率性能得到改善。从我们的测量中,我们发现SiC MESFET的钝化可通过抑制DC特性的不稳定性来降低表面效应并改善RF功率性能。

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