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The Effect of Channel Recess and Passivation on 4H-SiC MESFETs

机译:信道凹陷和钝化对4H-SiC MESFET的影响

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Channel-recessed 4H-SiC MESFETs were fabricated and demonstrated excellent small signal characteristics. A saturated current of 250-270 mA/mm at V_(gs) = 0 V and a maximum transconductance of 40-45 mS/mm were measured for channel-recessed devices with a gate length of 0.45 m. The three-terminal breakdown voltages (V_(ds)) range from 120 V to 150 V. The F_t and F_(max) of the 2 * 200 m devices were measured to be 14.5 GHz and 40 GHz, respectively. The channel recess technique results in a lower saturation current but higher breakdown voltage which makes it possible for the devices to operate at high voltages. Si_3N_4 passivation suppresses the instability in DC characteristics and improves CW power performance by reducing the surface effects. Less dispersion in the drain current during a power sweep was observed after passivation.
机译:介绍介绍的4H-SIC MESFET,并展示了优异的小信号特性。在V_(GS)= 0 V处的250-270 mA / mm的饱和电流和40-45ms / mm的最大跨导器用于栅极长度为0.45μm的通道凹陷器件。三端击穿电压(V_(DS))的范围为120 V至150 V.2 * 200 M器件的F_T和F_(MAX)分别测量为14.5GHz和40 GHz。频道凹陷技术导致较低的饱和电流但较高的击穿电压,这使得设备可以在高电压下操作。 SI_3N_4钝化抑制了直流特性中的不稳定性,并通过降低表面效应来提高CW功率性能。在钝化之后观察到在功率扫描期间的漏极电流中的较少分散。

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