Effect of UV light and low temperature on solution-processed, high-performance metal-oxide semiconductors and TFTs

摘要

This paper focuses on ultra-violet (UV)-curing of solution-processed metal-oxide (MO) semiconductors for application in thin film transistors (TFTs). The goal is to combine low-temperature thermal annealing with UV exposure and achieve printable transistors on flexible plastic substrates. In this paper we focus on the use of two different wavelengths of UV and clarify their effect on the performance of the metal-oxide semiconductors. The electrical properties of TFTs made with these semiconductors are characterized. The results show that wavelength of the UV exposure is critical for optimized performance of the semiconductor and the TFTs.